Terminal absolute filter element for photoresist
Terminal absolute filter element for photoresist is specially designed for filtering photoresist. It adopts high flow rate, high-precision PTFE or nylon filter membrane, combined with low precipitation HDPE framework, with extremely low dissolution, and is suitable for terminal filtration of photoresist. It can select a variety of filtration precision from 0.02 to 10 μ m, which can meet different filtration requirements. It can be customized according to the application and customer needs.
Contact Us